Coating apparatus and method of forming coating film

ABSTRACT

A coating apparatus for forming a coating film over a substrate includes a spin chuck for holding and rotating the substrate, a central coating nozzle over a central portion of the substrate, a plurality of first coating nozzles surrounding the central coating nozzle and spaced apart from the central coating nozzle by substantially a same first distance, and a plurality of second coating nozzles surrounding the central coating nozzle and spaced apart from the central coating nozzle by substantially a same second distance, wherein the second distance is greater than the first distance.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a Divisional of U.S. application Ser. No.14/291,575, filed on May 30, 2014, now U.S. Pat. No. 9,573,144, thecontents of which are hereby incorporated by reference.

BACKGROUND

The semiconductor integrated circuit (IC) industry has experienced rapidgrowth. Technological advances in IC materials and design have producedgenerations of ICs. Each generation has smaller and more complexcircuits than the previous generation. However, these advances haveincreased the complexity of processing and manufacturing ICs.

In the course of IC evolution, functional density (i.e., the number ofinterconnected devices per chip area) has generally increased whilegeometric size (i.e., the smallest component (or line) that can becreated using a fabrication process) has decreased. This scaling-downprocess generally provides benefits by increasing production efficiencyand lowering associated costs.

However, since the feature sizes continue to decrease, fabricationprocesses continue to become more difficult to perform. The fabricationprocesses include gap-filling processes, etching processes,photolithography processes, alignment processes, or the like. Therefore,it is a challenge to form reliable semiconductor devices with smallerand smaller sizes.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It shouldbe noted that, in accordance with the standard practice in the industry,various features are not drawn to scale. In fact, the dimensions of thevarious features may be arbitrarily increased or reduced for clarity ofdiscussion.

FIG. 1A is a side view of a coating apparatus, in accordance with someembodiments.

FIG. 1B is a top view of the central nozzle, the first nozzles, thesecond nozzles and the substrate of FIG. 1A, in accordance with someembodiments.

FIG. 1C is a perspective view of the central nozzle, the first nozzles,the second nozzles and the substrate of FIG. 1A, in accordance with someembodiments.

FIG. 2 is a top view of a central nozzle, first nozzles, second nozzlesand a substrate, in accordance with some embodiments.

FIG. 3 is a top view of a central nozzle, first nozzles, second nozzles,third nozzles and a substrate, in accordance with some embodiments.

FIG. 4 is a top view of a central nozzle, first nozzles and a substrate,in accordance with some embodiments.

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, orexamples, for implementing different features of the provided subjectmatter. Specific examples of components and arrangements are describedbelow to simplify the present disclosure. These are, of course, merelyexamples and are not intended to be limiting. For example, the formationof a first feature over or on a second feature in the description thatfollows may include embodiments in which the first and second featuresare formed in direct contact, and may also include embodiments in whichadditional features may be formed between the first and second features,such that the first and second features may not be in direct contact. Inaddition, the present disclosure may repeat reference numerals and/orletters in the various examples. This repetition is for the purpose ofsimplicity and clarity and does not in itself dictate a relationshipbetween the various embodiments and/or configurations discussed.

Further, spatially relative terms, such as “beneath,” “below,” “lower,”“above,” “upper” and the like, may be used herein for ease ofdescription to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the figures. The spatiallyrelative terms are intended to encompass different orientations of thedevice in use or operation in addition to the orientation depicted inthe figures. The apparatus may be otherwise oriented (rotated 90 degreesor at other orientations) and the spatially relative descriptors usedherein may likewise be interpreted accordingly. It is understood thatadditional operations can be provided before, during, and after themethod, and some of the operations described can be replaced oreliminated for other embodiments of the method.

FIG. 1A is a side view of a coating apparatus, in accordance with someembodiments. As shown in FIG. 1A, a coating apparatus 100 includes aspin chuck 110, a central coating nozzle 120 and first coating nozzles130. In some embodiments, the coating apparatus 100 further includessecond coating nozzles 140.

The spin chuck 110 is configured to hold and rotate a substrate 10, inaccordance with some embodiments. The substrate 10 includes a wafer orthe like, in accordance with some embodiments. The substrate 10 is in acircular shape and has a radius R. In some embodiments, the spin chuck110 is rotationally driven by a driving motor 112. The spin chuck 110securely holds the substrate 10 by, for example, vacuum suction.

FIG. 1B is a top view of the central nozzle, the first nozzles, thesecond nozzles and the substrate of FIG. 1A, in accordance with someembodiments. FIG. 1C is a perspective view of the central nozzle, thefirst nozzles, the second nozzles and the substrate of FIG. 1A, inaccordance with some embodiments.

As shown in FIGS. 1A-1C, the central coating nozzle 120 is located rightover a central portion C of the substrate 10, in accordance with someembodiments. The central coating nozzle 120 is configured to provide acoating liquid to the substrate 10, in accordance with some embodiments.In some embodiments, the coating liquid includes a polymer material(e.g., an insulating material).

The first coating nozzles 130 surround the central coating nozzle 120and are spaced apart from the central coating nozzle 120 bysubstantially a same first distance D1, in accordance with someembodiments. In some embodiments, the first coating nozzles 130 arearranged in a circular ring shape. In some embodiments, the firstcoating nozzles 130 are over a peripheral ring region 12 of thesubstrate 10. The first coating nozzles 130 are configured to providethe coating liquid to the substrate 10, in accordance with someembodiments.

In some embodiments, the number of first coating nozzles 130 is greaterthan two. For example, the number of first coating nozzles 130 is three.In some embodiments, the first coating nozzles 130 are at substantiallya same angular distance θ1 from one another with respect to the centralcoating nozzle 120.

In some embodiments, if the number of first coating nozzles 130 isthree, the angular distance θ1 is about 120°. In some embodiments, thefirst distance D1 between the first coating nozzle 130 and the centralcoating nozzle 120 is greater than a half of the radius R of thesubstrate 10.

In some embodiments, the second coating nozzles 140 surround the centralcoating nozzle 120. In some embodiments, the second coating nozzles 140are spaced apart from the central coating nozzle 120 by substantially asame second distance D2. The second distance D2 is greater than thefirst distance D1. In some embodiments, the second coating nozzles 140are arranged in a circular ring shape. In some embodiments, the secondcoating nozzles 140 are over an outermost peripheral ring region 14 ofthe substrate 10. The second coating nozzles 140 are configured toprovide the coating liquid to the substrate 10, in accordance with someembodiments.

In some embodiments, the second coating nozzles 140 are at substantiallya same angular distance θ 2 from one another with respect to the centralcoating nozzle 120. In some embodiments, the number of second coatingnozzles 140 is greater than the number of first coating nozzles 130.

In some embodiments, the number of second coating nozzles 140 is four,and the number of first coating nozzles 130 is three. In someembodiments, if the number of second coating nozzles 140 is four, theangular distance θ 2 is about 90°. In some embodiments, the number ofcoating nozzles close to an edge 16 of the substrate 10 is greater thanthe number of coating nozzles close to the central portion C of thesubstrate 10.

In some embodiments, the ratio (D1/D2) of the first distance D1 to thesecond distance D2 is in a range from about 0.6 to about 0.9. In someembodiments, the first distance D1 is greater than the difference(D2−D1) between the second distance D2 and the first distance D1. Insome embodiments, the difference (D2−D1) between the second distance D2and the first distance D1 is greater than a distance D3 between thesecond coating nozzle 140 and the edge 16 of the substrate 10.

As shown in FIG. 1A, the coating apparatus 100 further includes a showerhead 150, in accordance with some embodiments. The central coatingnozzle 120, the first coating nozzles 130 and the second coating nozzles140 are fixed to the shower head 150, in accordance with someembodiments. As shown in FIG. 1A, the coating apparatus 100 furtherincludes a coating liquid supply source 160, in accordance with someembodiments.

The central coating nozzle 120 is connected to the coating liquid supplysource 160 through one supply pipe 176, in accordance with someembodiments. The three first coating nozzles 130 are connected to thecoating liquid supply source 160 through three supply pipes 174,respectively, in accordance with some embodiments. The four secondcoating nozzles 140 are connected to the coating liquid supply source160 through four supply pipes 172, respectively, in accordance with someembodiments.

The supply pipes 172, 174 and 176 pass through the shower head 150, inaccordance with some embodiments. It should be noted that FIG. 1A doesnot show all of the first coating nozzles 130, the second coatingnozzles 140 and the supply pipes 172 and 174 due to the view angle.

The supply pipes 172, 174 and 176 are provided with flow control valves182, 184 and 186, respectively, in accordance with some embodiments. Theflow control valves 182, 184 and 186 control the timing of supplying thecoating liquid and the flow rate of the coating liquid, in accordancewith some embodiments. The central coating nozzle 120, the first coatingnozzles 130 and the second coating nozzles 140 are controlledindependently by controlling the flow control valves 182, 184 and 186,in accordance with some embodiments.

In some embodiments, a method of forming a coating film over thesubstrate 10 is provided as follows. As shown in FIG. 1A, the substrate10 is held on the spin chuck 110, in accordance with some embodiments.In some embodiments, a film 20 is formed over the substrate 10. The film20 includes metal, semiconductor oxide or other suitable materials. Insome embodiments, the film 20 is not formed. Thereafter, the substrate10 is rotated by the spin chuck 110, which is rotationally driven by thedriving motor 112, in accordance with some embodiments.

In some embodiments, the flow control valve 186 is opened to provide acentral coating liquid spray 196 to the substrate 10 via the centralcoating nozzle 120 to form a coating film 30. The coating film 30includes, for example, silicon oxide. Afterwards, the flow controlvalves 184 are opened to provide first coating liquid sprays 194, inaccordance with some embodiments.

Thereafter, the valves 182 are opened to provide second coating liquidsprays 192, in accordance with some embodiments. In some embodiments,the central coating liquid spray 196, the first coating liquid sprays194 and the second coating liquid sprays 192 provide the same coatingliquid. In some embodiments, the first coating liquid sprays 194 and thesecond coating liquid sprays 192 are also referred to as peripheralcoating liquid sprays.

In some embodiments, a flow time of the central coating liquid spray 196is longer than a flow time of the first coating liquid spray 194. Insome embodiments, a flow time of the first coating liquid spray 194 islonger than a flow time of the second coating liquid spray 192. That is,if the coating liquid spray is closer to the central portion C of thesubstrate 10, the flow time of the coating liquid spray is longer.

In some embodiments, a flow rate of the central coating liquid spray 196is greater than that of the first coating liquid spray 194. In someembodiments, the flow rate of the first coating liquid spray 194 isgreater than that of the second coating liquid spray 192. That is, ifthe coating liquid spray is closer to the central portion C of thesubstrate 10, the flow rate of the coating liquid spray is greater.

In some embodiments, a central coating liquid supply quantity of thecentral coating liquid spray 196 is greater than the sum of coatingliquid supply quantities of the first coating liquid sprays 194. In someembodiments, the sum of coating liquid supply quantities of the firstcoating liquid sprays 194 is greater than the sum of coating liquidsupply quantities of the second coating liquid sprays 192. That is, ifthe coating liquid sprays are closer to the edge of the substrate 10,the sum of the coating liquid supply quantities of the coating liquidsprays is less, in accordance with some embodiments.

In some embodiments, the central coating liquid supply quantity of thecentral coating liquid spray 196 is greater than the sum of coatingliquid supply quantities of the first coating liquid sprays 194 and thesecond coating liquid sprays 192. In some embodiments, a ratio of thecentral coating liquid supply quantity of the central coating liquidspray 196 to the sum of coating liquid supply quantities of the firstcoating liquid sprays 194 and the second coating liquid sprays 192ranges from about 2 to about 9.

If the ratio is less than 2, the central coating liquid supply quantityof the central coating liquid spray 196 may be too small, and thereforethe coating film 30 formed in a central region 18 of the substrate 10may be too thin. If the ratio is greater than 9, the sum of coatingliquid supply quantities of the first coating liquid sprays 194 and thesecond coating liquid sprays 192 may be too small, and the coating film30 formed in the peripheral ring region 12 and the outermost peripheralring region 14 of the substrate 10 may be non-uniform.

In some embodiments, the first coating liquid sprays 194 surround thecentral coating liquid spray 196 and are spaced apart from the centralcoating liquid spray 196 by substantially a same distance D4. In someembodiments, the second coating liquid sprays 192 surround the centralcoating liquid spray 196 and are spaced apart from the central coatingliquid spray 196 by substantially a same distance D5. In someembodiments, the distance D5 is greater than the distance D4.

In some embodiments, the number of second coating liquid sprays 192 isgreater than the number of the first coating liquid sprays 194. In someembodiments, the number of coating liquid sprays close to the edge ofthe substrate 10 is greater than the number of coating liquid spraysclose to the central portion C of the substrate 10.

As shown in FIGS. 1A-1C, the central coating liquid spray 196, the firstcoating liquid sprays 194 and the second coating liquid sprays 192 areright under the central coating nozzle 120, the first coating nozzles130 and the second coating nozzles 140, respectively. Therefore, thefirst coating liquid sprays 194 are at substantially the same angulardistance θ1 from one another with respect to the central coating liquidspray 196. In some embodiments, the second coating liquid sprays 192 areat substantially the same angular distance θ2 from one another withrespect to the central coating liquid spray 196.

In some embodiments, the coating liquid, used to form the coating film30, has a viscosity higher than that of a photoresist material. Theviscosity of the coating liquid is in a range from about 1 cP to about 2cP. Since the viscosity of the coating liquid is high, the rotationspeed of the spin chuck 110 is high enough to uniformly spread out thecoating liquid over the substrate 10. In some embodiments, the rotationspeed of the spin chuck 110 ranges from about 2000 rpm to about 3000rpm.

Since the rotation speed is high, the coating liquid over the peripheralring region 12 and the outermost peripheral ring region 14 of thesubstrate 10 may be affected by an air shear stress and be easily spunoff the substrate 10. In some embodiments, the first and the secondcoating nozzles 130 and 140 provide a little amount of coating liquid tothe peripheral ring region 12 and the outermost peripheral ring region14 of the substrate 10 to compensate for the loss of the coating liquidfrom the central coating nozzle 120. Therefore, the first coatingnozzles 130 and the second coating nozzles 140 may improve theuniformity of the thickness of the coating film 30.

FIG. 2 is a top view of a central nozzle, first nozzles, second nozzlesand a substrate, in accordance with some embodiments. As shown in FIG.2, in some embodiments, the number of first coating nozzles 130 is four.In some embodiments, the first coating nozzles 130 are at substantiallythe same angular distance θ1 from one another with respect to thecentral coating nozzle 120. In some embodiments, the number of firstcoating nozzles 130 is four, and the angular distance θ1 is about 90°.

In some embodiments, the second coating nozzles 140 are at substantiallythe same angular distance θ2 from one another with respect to thecentral coating nozzle 120. In some embodiments, the number of secondcoating nozzles 140 is greater than the number of first coating nozzles130.

In some embodiments, the number of second coating nozzles 140 is six,and the number of first coating nozzles 130 is four. In someembodiments, the number of second coating nozzles 140 is six, and theangular distance θ2 is about 60°. In some embodiments, the first coatingnozzles 130 and the second coating nozzles 140 are also referred to asperipheral coating nozzles.

FIG. 3 is a top view of a central nozzle, first nozzles, second nozzles,third nozzles and a substrate, in accordance with some embodiments. Asshown in FIG. 3, in some embodiments, a coating apparatus 300 is similarto the coating apparatus 100 of FIGS. 1A-1C, except that the coatingapparatus 300 further includes third coating nozzles 310.

The third coating nozzles 310 surround the central coating nozzle 120and are spaced apart from the central coating nozzle 120 bysubstantially the same distance D6, in accordance with some embodiments.In some embodiments, the third coating nozzles 310 are arranged in acircular ring shape.

In some embodiments, the number of third coating nozzles 310 is greaterthan the number of second coating nozzles 140. In some embodiments, thenumber of third coating nozzles 310 is six. In some embodiments, thethird coating nozzles 310 are at substantially the same angular distanceθ3 from one another with respect to the central coating nozzle 120.

In some embodiments, the first distance D1 is greater than thedifference (D2−D1) between the second distance D2 and the first distanceD1. In some embodiments, the difference (D2−D1) between the seconddistance D2 and the first distance D1 is greater than the difference(D6−D2) between the distance D6 and the second distance D2. In someembodiments, the difference (D6−D2) between the distance D6 and thesecond distance D2 is greater than a distance D7 between the thirdcoating nozzle 310 and the edge 16 of the substrate 10.

FIG. 4 is a top view of a central coating nozzle, first coating nozzlesand a substrate, in accordance with some embodiments. As shown in FIG.4, in some embodiments, a coating apparatus 400 is similar to thecoating apparatus 100 of FIGS. 1A-1C, except that the coating apparatus400 does not have the second coating nozzles 140.

In accordance with some embodiments, coating apparatuses and methods forforming a coating film are provided. The methods provide peripheralcoating liquid sprays over peripheral regions of a substrate, which isto be spin-coated, to compensate for the loss of a coating liquid overperipheral regions from a central coating liquid spray. Therefore, theperipheral coating liquid sprays may improve the uniformity of thethickness of the formed coating film.

In accordance with some embodiments, a method of forming a coating filmover a substrate is provided. The method includes spinning thesubstrate. The method further includes providing a central coatingliquid spray over a central portion of the substrate. The method alsoincludes providing first coating liquid sprays over the substrate. Thefirst coating liquid sprays surround the central coating liquid sprayand are spaced apart from the central coating liquid spray bysubstantially a same first distance.

In accordance with some embodiments, a method of forming a coating filmover a substrate is provided. The method includes spinning thesubstrate. The method further includes providing a central coatingliquid spray over a central portion of the substrate. The method alsoincludes providing first coating liquid sprays over the substrate. Thefirst coating liquid sprays surround the central coating liquid sprayand are spaced apart from the central coating liquid spray bysubstantially a same first distance. A central coating liquid supplyquantity of the central coating liquid spray is greater than the sum ofcoating liquid supply quantities of the first coating liquid sprays.

In accordance with some embodiments, a coating apparatus for forming acoating film over a substrate is provided. The coating apparatusincludes a spin chuck for holding the substrate. The coating apparatusfurther includes a central coating nozzle over a central portion of thesubstrate. The coating apparatus also includes first coating nozzlessurrounding the central coating nozzle and spaced apart from the centralcoating nozzle by substantially a same first distance.

The foregoing outlines features of several embodiments so that thoseskilled in the art may better understand the aspects of the presentdisclosure. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions, andalterations herein without departing from the spirit and scope of thepresent disclosure.

What is claimed is:
 1. A coating apparatus for forming a coating filmover a substrate, comprising: a spin chuck for holding and rotating thesubstrate; a central coating nozzle over a central portion of thesubstrate; a plurality of coating nozzles over the substrate, whereinthe coating nozzles comprises all coating nozzles over the substrate,and the coating nozzles comprises: a plurality of first coating nozzlessurrounding the central coating nozzle and spaced apart from the centralcoating nozzle by substantially a same first distance, the first coatingnozzles are nearest ones of the coating nozzles related to the centralcoating nozzle, the substrate is in a circular shape and has a radius,the first distance between the first coating nozzles and the centralcoating nozzle is greater than a half of the radius; and a plurality ofsecond coating nozzles surrounding the central coating nozzle and spacedapart from the central coating nozzle by substantially a same seconddistance, wherein the second distance is greater than the firstdistance; a coating liquid supply source; a first supply pipe connectingthe coating liquid supply source to the central coating nozzle fortransferring a coating liquid from the coating liquid supply source tothe central coating nozzle; a first flow control valve directlyconnecting the first supply pipe for controlling a first flow rate ofthe coating liquid in the first supply pipe; a plurality of secondsupply pipes connecting the coating liquid supply source to the firstcoating nozzles for transferring the coating liquid from the coatingliquid supply source to the first coating nozzles; and a plurality ofsecond flow control valves respectively and directly connecting thesecond supply pipes for controlling a second flow rate of the coatingliquid in the second supply pipes.
 2. The coating apparatus for forminga coating film over a substrate as claimed in claim 1, wherein the firstcoating nozzles are at substantially a same first angular distance fromone another with respect to the central coating nozzle.
 3. The coatingapparatus for forming a coating film over a substrate as claimed inclaim 2, wherein the second coating nozzles are at substantially a samesecond angular distance from one another with respect to the centralcoating nozzle.
 4. The coating apparatus for forming a coating film overa substrate as claimed in claim 3, wherein the first angular distance isgreater than the second angular distance.
 5. The coating apparatus forforming a coating film over a substrate as claimed in claim 1, whereinthere is no coating nozzle between the first coating nozzles and thecentral coating nozzle.
 6. The coating apparatus for forming a coatingfilm over a substrate as claimed in claim 1, wherein the second coatingnozzles are at substantially a same angular distance from one anotherwith respect to the central coating nozzle.
 7. The coating apparatus forforming a coating film over a substrate as claimed in claim 1, whereinthe first distance is greater than the difference between the seconddistance and the first distance.
 8. The coating apparatus for forming acoating film over a substrate as claimed in claim 7, wherein thedifference between the second distance and the first distance is greaterthan a third distance between the second coating nozzles and an edge ofthe substrate.
 9. A coating apparatus for forming a coating film over asubstrate, comprising: a spin chuck for holding and rotating thesubstrate; a central coating nozzle over a central portion of thesubstrate; a plurality of coating nozzles over the substrate, whereinthe coating nozzles comprises all coating nozzles over the substrate,and the coating nozzles comprises: a plurality of first coating nozzlessurrounding the central coating nozzle and spaced apart from the centralcoating nozzle by substantially a same first distance, the first coatingnozzles are nearest ones of the coating nozzles related to the centralcoating nozzle, the substrate is in a circular shape and has a radius,the first distance between the first coating nozzles and the centralcoating nozzle is greater than a half of the radius; and a plurality ofsecond coating nozzles surrounding the central coating nozzle and spacedapart from the central coating nozzle by substantially a same seconddistance, wherein the second distance is greater than the firstdistance, and a first number of the second coating nozzles is greaterthan a second number of the first coating nozzles; a coating liquidsupply source; a plurality of first supply pipes connecting the coatingliquid supply source to the first coating nozzles for transferring acoating liquid from the coating liquid supply source to the firstcoating nozzles; a plurality of first flow control valves respectivelyand directly connecting the first supply pipes for controlling a firstflow rate of the coating liquid in the first supply pipes; a pluralityof second supply pipes connecting the coating liquid supply source tothe second coating nozzles for transferring the coating liquid from thecoating liquid supply source to the second coating nozzles; and aplurality of second flow control valves respectively and directlyconnecting the second supply pipes for controlling a second flow rate ofthe coating liquid in the second supply pipes.
 10. The coating apparatusfor forming a coating film over a substrate as claimed in claim 9,further comprising: a shower head, wherein the central coating nozzle,the first coating nozzles, and the second coating nozzles are fixed tothe shower head.
 11. The coating apparatus for forming a coating filmover a substrate as claimed in claim 10, further comprising: a thirdsupply pipe connecting the coating liquid supply source to the centralcoating nozzle for transferring the coating liquid from the coatingliquid supply source to the central coating nozzle; and a third flowcontrol valve directly connecting the third supply pipe for controllinga third flow rate of the coating liquid in the third supply pipe. 12.The coating apparatus for forming a coating film over a substrate asclaimed in claim 11, wherein the first supply pipes, the second supplypipes, and the third supply pipe pass through the shower head.
 13. Thecoating apparatus for forming a coating film over a substrate as claimedin claim 9, wherein the first coating nozzles are at substantially asame first angular distance from one another with respect to the centralcoating nozzle.
 14. The coating apparatus for forming a coating filmover a substrate as claimed in claim 13, wherein the second coatingnozzles are at substantially a same second angular distance from oneanother with respect to the central coating nozzle.
 15. A coatingapparatus for forming a coating film over a substrate, comprising: aspin chuck for holding and rotating the substrate; a central coatingnozzle over a central portion of the substrate; a plurality of coatingnozzles over the substrate and comprising: a plurality of first coatingnozzles surrounding the central coating nozzle and spaced apart from thecentral coating nozzle by substantially a same first distance; aplurality of second coating nozzles surrounding the central coatingnozzle and spaced apart from the central coating nozzle by substantiallya same second distance, wherein the second distance is greater than thefirst distance, and there is no coating nozzle between the plurality offirst coating nozzles and the plurality of second coating nozzles; and aplurality of third coating nozzles surrounding the central coatingnozzle and spaced apart from the central coating nozzle by substantiallya same third distance, wherein the third distance is greater than thesecond distance, and a first difference between the second distance andthe first distance is greater than a second difference between the thirddistance and the second distance; a coating liquid supply source; afirst supply pipe connecting the coating liquid supply source to thecentral coating nozzle for transferring a coating liquid from thecoating liquid supply source to the central coating nozzle; a first flowcontrol valve directly connecting the first supply pipe for controllinga first flow rate of the coating liquid in the first supply pipe; aplurality of second supply pipes connecting the coating liquid supplysource to the second coating nozzles for transferring the coating liquidfrom the coating liquid supply source to the second coating nozzles; anda plurality of second flow control valves respectively and directlyconnecting the second supply pipes for controlling a second flow rate ofthe coating liquid in the second supply pipes.
 16. The coating apparatusfor forming a coating film over a substrate as claimed in claim 15,wherein a first number of the third coating nozzles is greater than asecond number of the second coating nozzles.
 17. The coating apparatusfor forming a coating film over a substrate as claimed in claim 15,wherein the third coating nozzles are at substantially a same firstangular distance from one another with respect to the central coatingnozzle.
 18. The coating apparatus for forming a coating film over asubstrate as claimed in claim 17, wherein the second coating nozzles areat substantially a same second angular distance from one another withrespect to the central coating nozzle, and the second angular distanceis greater than the first angular distance.
 19. The coating apparatusfor forming a coating film over a substrate as claimed in claim 18,wherein the first coating nozzles are at substantially a same thirdangular distance from one another with respect to the central coatingnozzle, and the third angular distance is greater than the secondangular distance.
 20. The coating apparatus for forming a coating filmover a substrate as claimed in claim 1, further comprising: a pluralityof third supply pipes connecting the coating liquid supply source to thesecond coating nozzles for transferring the coating liquid from thecoating liquid supply source to the second coating nozzles; and aplurality of third flow control valves respectively and directlyconnecting the third supply pipes for controlling a third flow rate ofthe coating liquid in the third supply pipes.